Nanometer table-top proximity x-ray lithography with liquid-target laser-plasma source
A compact laser-plasma proximity x-ray lithography system suitable for laboratory-scale low-volume nanometer patterning is presented. The laser-plasma source, which is based on a fluorocarbon liquid-jet target, generates high-brightness lambda = 1.2-1.7 nm x-ray emission with only negligible debris production. The Au/SiNx x-ray mask is fabricated by employing ion milling and a high-contrast e-beam